patent
Warn
Audited by Snyk on Jun 14, 2026
Risk Level: MEDIUM
Full Analysis
MEDIUM W011: Third-party content exposure detected (indirect prompt injection risk).
- Third-party content exposure detected (high risk: 0.85). The skill’s runtime LLM context is populated from outsider-authored free text scraped from public patent sources (e.g., Google Patents/Espacenet/USPTO PPS pages and Lens.org citation data) during Phase 3–6, which are not authored by the operating user.
Issues (1)
W011
MEDIUMThird-party content exposure detected (indirect prompt injection risk).
Audit Metadata